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SCRP1200 Series
Resistance Heating PVT Silicon Carbide Crystal Growth Furnace
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Employs multi-segment resistance heating, enabling dynamic adjustment of the temperature gradient during crystal growth; 01
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Gas path planning and thermal field protection technology reduce thermal field decay during crystal growth, increase thermal field lifespan, and improve thermal field stability; 02
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Equipped with a crystal growth interface visualization system to monitor crystal growth status in real time, thereby improving crystal growth efficiency and yield. 03
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Our address
No. 49, Zonghui Road, Nanjing Economic and Technological Development Zone
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Our website uses cookies and similar technologies to personalize the advertising shown to you and to help you get the best experience on our website. For more information, see our Privacy & Cookie Policy
COOKIES
Our website uses cookies and similar technologies to personalize the advertising shown to you and to help you get the best experience on our website. For more information, see our Privacy & Cookie Policy
These cookies are necessary for basic functions such as payment. Standard cookies cannot be turned off and do not store any of your information.
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