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MSIR1050 Si Casting Furnace
MSIR1050 Si Casting furnace has been specifically developed to grow round, high-quality multi-crystalline Si ingots to make semiconductor consumable parts. It features resistance heating with three independently controlled heating zones, which provide excellent temperature gradient control for crystal growth. Compared with traditional DSS method, it offers a perfect alternative and solution to produce cheaper and high-quality multi-crystalline Si parts for semiconductor applications.
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No. 49, Zonghui Road, Nanjing Economic and Technological Development Zone
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Our website uses cookies and similar technologies to personalize the advertising shown to you and to help you get the best experience on our website. For more information, see our Privacy & Cookie Policy
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