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Silicon Carbide Single Crystal Furnace SCRP1200 Series – Resistive Heating PVT
| Parameter Item | Technical Indicators |
| Device Model | SCRP1200 |
| Device dimensions | 2600x2600x4400mm |
| Crystal Growth Method | PVT |
| Applicable Substrate Size | 8 inches |
| Maximum Operating Temperature | 2400℃ |
| Vacuum System | Ultimate vacuum: 5 × 10⁻⁴ Pa; pressure rise rate ≤ 5 Pa/12 h. |
| Air circuit system | Gas types: Ar, N₂, H₂, etc. |
Our address
No. 49, Zonghui Road, Nanjing Economic and Technological Development Zone
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Our website uses cookies and similar technologies to personalize the advertising shown to you and to help you get the best experience on our website. For more information, see our Privacy & Cookie Policy
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Our website uses cookies and similar technologies to personalize the advertising shown to you and to help you get the best experience on our website. For more information, see our Privacy & Cookie Policy
These cookies are necessary for basic functions such as payment. Standard cookies cannot be turned off and do not store any of your information.
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