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Silicon Carbide Single Crystal Furnace LP Series
| Parameter Item | Technical Indicators |
||
| Device Model |
LP-SCMP620 | LP-SCMP1200 | LP-SCRP1200 |
| Device dimensions |
2950x3250x3700mm | 4200x3600x5000mm | 2604x2477x3904mm |
| Applicable Substrate Size |
6 inches | 6 inches | 6 inches (upgradeable to 8 inches) |
| Heating Method |
Induction Method | Induction Method | Resistance heating |
| Crystal Growth Method | LPE |
||
| Maximum Operating Temperature | 2200℃ |
||
| Vacuum System | Ultimate vacuum: 5 × 10⁻⁴ Pa; pressure rise rate ≤ 5 Pa/12 h. |
||
| Air circuit system | Gas types: Ar, N₂, H₂, etc. |
||
Our address
No. 49, Zonghui Road, Nanjing Economic and Technological Development Zone
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Our website uses cookies and similar technologies to personalize the advertising shown to you and to help you get the best experience on our website. For more information, see our Privacy & Cookie Policy
These cookies are necessary for basic functions such as payment. Standard cookies cannot be turned off and do not store any of your information.
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