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SCG600 Series Semiconductor‑Grade Single‑Crystal Silicon Furnace
| Device Model |
Silicon Component Single-Crystal Furnace SCG600MCZ |
| Parameter Item |
Technical Indicators |
| Device dimensions |
8000x5500x10600mm |
| Device weight |
≈30 tons |
| Ultimate vacuum |
≤ 2Pa |
| Heating Method |
Resistance heating |
| Temperature control range |
900–1600℃ |
| Crystal size |
18–24 inches |
| Crystal Growth Method |
MCZ |
| Chamber Cooling Method |
Water cooling |
| Process Gas Type |
Ar |
Our address
No. 49, Zonghui Road, Nanjing Economic and Technological Development Zone
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Our website uses cookies and similar technologies to personalize the advertising shown to you and to help you get the best experience on our website. For more information, see our Privacy & Cookie Policy
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Our website uses cookies and similar technologies to personalize the advertising shown to you and to help you get the best experience on our website. For more information, see our Privacy & Cookie Policy
These cookies are necessary for basic functions such as payment. Standard cookies cannot be turned off and do not store any of your information.
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